Robust ICP-OES Systems

Our robust ICP-OES systems offer easy-to-use software and multi-element detection technology far superior to that of single-element AAS and multi-element microwave plasma techniques. They are ideal for laboratories with low sample throughput requirements and users new to the technique or who require a simple solution for multi-elemental analysis.

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Advanced, High-Throughput ICP-OES Systems

Analyze high-matrix trace elemental samples with sensitive multi-element detection and meet your data requirements. These instruments include both the iFR analysis mode, which measures the entire wavelength range in one measurement, and a eUV analysis mode, which measures the UV region of the spectrum with greater sensitivity.

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Plasma viewVertical Radial or Vertical Duo
Start up time1 hour (from off)15 minutes (from standby)5 minutes (from standby)
Wavelength rangeiFR mode 167.021 nm - 852.145 nmiFR mode 167.021 nm - 852.145 nm
eUV mode 167.021 nm - 240.063 nm
Resolution @ 200nm7 pm
Measurement modesiFRiFR and eUV
Camera technologyCID821
Full spectrum captureYes
RF source radial1150 W750, 1150 or 1350 W750 to 1600 W
RF source duo1150 W750, 1150 or 1350 W750 to 1600 W
Gas flow controlsOptimized MFCVariable MFC
Plasma gasFixed at 12.5 L/minFixed, optimized at
8.5, 12.5 or 14.5 L/min
0 to 20 L/min
Auxiliary gasFixed at 0.5 L/minSelectable
0.5, 1 or 1.5 L/min
0 to 2 L/min
Nebulizer gas0.3 to 0.8 L/min0 to 1.5 L/min0.0 to 1.5 L/min
Additional gas0 - 0.25 L/min

* Required field

Style Sheet for Global Design System
CMD SchemaApp code